The control system with the microprocessor operating device of magnetrons contains sensor of technological process parameters, devices for measurement of process parameters, the device for regulation of process parameters, and also the power supply system of magnetron and an operator's control panel with the display, connected with the microprocessor operating device. The basic measured and adjustable parameters of the installation of such type are: electric power input to magnetron; working gas pressure in the chamber; cathode temperature; substrate temperature; speed of sedimentation and thickness of a formed film; duration of process, structure of gas in the chamber, etc.
By means of the microprocessor device full (single-button) control of installation and by all necessary parameters of technological process under predetermined programs which quantity can be from one up to five is carried out. In some cases the microprocessor operating device is supplied by the board of updating of process parameters with the display, the recording device of current parameters, and also the interface that allows to make reprogramming, operatively to change parameters of process, and also to connect it to larger computer complexes and operating systems.
The microprocessor device should provide control on one of the predetermined programs with following processes (besides vacuum system control):
- timing loop of technological process, including spilling of the chambers, letting-to-working gas, heating of substrates, ionic clearing, outlet on a dispersion mode and the dispersion process;
- determination of voltage and control of current in the ionic clearing, outlet on a dispersion mode and the dispersion of a material processes;
- working gas pressure in the chamber;
- substrate temperature;
- thickness and deposition rate of a film;
- speed of substrates moving during dispersion and at preparatory operations.
The firm Materials Research in last serial magnetron atomizing systems of a series 900 A uses full microprocessor management [25]. The operator still has performance only three auxiliary operations - loading and unloading of substrates, and also closings of the vacuum chamber. The given control system allows to work with two programs of twenty-graded technological processes. Thus following operations can be programmed: consecutive dispersion of three targets; heating of a substrate; clearing; a pause between operations; switching-off of working gas submission; exhaust up to the predetermined pressure; replacement of substrates (in three various modes), etc. The realization of necessary parameters choice of process, for example, pressure of working gas; a level of the electric power brought to magnetron; time of scanning; high vacuum level; heat time of substrates, etc is provided.
The Chosen program of technological process is formed by a simple set of preset values of technological parameters on a type-setting processor field and brought in memory of system by pressing of the keys corresponding to programmed operations.
According to the technical project it is required to design vacuum technological installation for depositing of functional coating on oil filters covers. Having analysed initial data, we define the design of installation.
The basic requirement defining the design is products processing in it, in this case it is cover. It is the most rational to place products in the chamber in three rows in fives pieces in everyone. Thus, simultaneously in the chamber fifteen products are processed. In a technological compartment before covering deposition the surface of products is preliminary cleared.
The general view of designed installation is presented on sheet ХАИ.461.06.ДП.12.ВО.02.
Technological installation consists of following basic parts:
Уважаемый посетитель!
Чтобы распечатать файл, скачайте его (в формате Word).
Ссылка на скачивание - внизу страницы.