Физика \ Конструкция и проектирование агрегатов РРД

The temperature of a substrate, while the covering is drawing on it’s surface, страница 2


Figure 1 Prominent features and scopes of magnetron sputtering systems

Table 1 Comparative characteristics of coating drawing methods

Characteristic

Electron beam evaporation

High-frequency sputtering

Magnetron sputtering

Process of particle generation

Energy source

An electron beam gun

The high-frequency glow discharge

Magnetron glow discharge

Way of substance generation

electron bombardment

ion bombardment

ion bombardment

Energy carriers

Electrons

Ions

Ions

Energy of bombarding particles, keV

10…30

0.1…3

0.3…0.7

Average specific capacity, W/sm2

(0.2…2)·103

2·101

2·102

Maximal specific capacity, W/sm2

104…105

102

5·102…103

Average density of a current, A/sm2

(0.5…5)·10-1

3·10-3

3·10-1

Source of particles

Specific speed of evaporation / sputtering, g·sm-2·s-1

(2…20)·10-3

(2…20)·10-7

(4…40)·10-3

Efficiency of process, g·Joule-1

3·10-6

6·10-7

3·10-6

Energy of generated particles, eV

0.1…0.2

10…200

10…20

Process of coating precipitation

Precipitation speed, nm/ sec

10…60

0.3…3

10…60

Energy of precipitable particles, eV

0.1…0.2

0.2…20

0.2…10

Working pressure, Pa

10-4

0.5…2

0.2…10

Specific capacity, dissipated on a substrate, Wt/sm-2

0.1

5

1

Substrate heating during precipitation, K

To 770

To 670

To 370

Source of radiation influence on a substrate

X-ray radiation (electrons)

Secondary electrons (x-ray radiation, photons, ions)

Photons (ions)

Thus, it is clear, that magnetron sputtering systems as the method of reception of thin-film coverings has a number of advantages over other vacuum methods that causes their wide application and prospect of development. Taking into account prospect and applicability of this method, in this work the analysis of heat modes of products when precipitation of coatings with the help of magnetron sputtering systems is carried out.

The purpose of work is to carry out the analysis of the processes influencing a thermal mode of a product when drawing coverings with the help of magnetron sputtering systems and to offer the technique of a product  heat mode estimation when drawing coatings with use of magnetron sputtering systems.

Object of research are the processes, being sources of heat in magnetron sputtering systems.

Tasks of work:

Carrying out of the work review of domestic and foreign authors on a theme of work;

The analysis of the review materials and specification of the problem put by;

Development of the technique of a product heat mode estimation when drawing coatings in magnetron sputtering systems;

Creation of the software for realization of the developed technique;

Comparison of carried out estimations with experimental data.


1. The general conception of work

At present magnetron sputtering systems have wide application. However the method is mastered not long ago, there is no enough full and proved technique of definition of a product heat mode when drawing coatings with use of magnetron sputtering systems. More often the heat mode of a product is determined as a result of lines of experiments. Therefore there is a requirement to create a simple and universal technique of a product heat mode estimation when drawing coatings with use of magnetron sputtering systems.

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